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tio2 Sputtering Target Titanium Target Silver Titanium Disc Target Sputtering to Medical Applications In medical applications, high-performance materials are required to meet strict demands for biocompatibility, corrosion resistance, and mechanical properties. Titanium and titanium alloys (such as Grade 2, Grade 5, and Grade 7), when combined with aluminum, form alloys that are widely used in sputtering targets...
tio2 Sputtering Target Titanium Target Silver Titanium Disc Target Sputtering to Medical Applications In medical applications, high-performance materials are required to meet strict demands for biocompatibility, corrosion resistance, and mechanical properties. Titanium and titanium alloys (such as Grade 2, Grade 5, and Grade 7), when combined with aluminum, form alloys that are widely used in sputtering targets... more
Brand Name:LHTi
Model Number:Titanium Target
Place of Origin:Baoji, Shaanxi, China
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...Sputtering Target Zirconium Rotatable Sputtering Target , Zirconium Rotatable Target , Zirconium Sputtering Target , Zirconium Rotary Sputtering Target , Zirconium Rotating Sputtering Target. Description JINXING company focus on the sputtering target ( Rotatable sputtering target , Planar Sputtering target , Spray Rotary sputtering target , Noble Metal sputtering target...
...Sputtering Target Zirconium Rotatable Sputtering Target , Zirconium Rotatable Target , Zirconium Sputtering Target , Zirconium Rotary Sputtering Target , Zirconium Rotating Sputtering Target. Description JINXING company focus on the sputtering target ( Rotatable sputtering target , Planar Sputtering target , Spray Rotary sputtering target , Noble Metal sputtering target... more
Brand Name:JINXING
Model Number:Zirconium Sputtering Target
Place of Origin:China
Zirconium Rotatable Sputtering Target For PVD Coating Systerm High Density
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...Sputtering Target High Purity 99.995% Circular Ti Titanium Sputtering Target Titanium sputtering target PVD coating Grade 1 Titanium Arc Target Ti Target titanium sputtering target 99.9% Tiox Titanium Oxide Rotary Target sputtering target Pvd vacuum coating Titanium Oxide TIOX Sputtering Target high purity GR1 sputtering titanium target ★ Material Titanium Gr. 1 Key words Titanium sputtering target Titanium sputtering
...Sputtering Target High Purity 99.995% Circular Ti Titanium Sputtering Target Titanium sputtering target PVD coating Grade 1 Titanium Arc Target Ti Target titanium sputtering target 99.9% Tiox Titanium Oxide Rotary Target sputtering target Pvd vacuum coating Titanium Oxide TIOX Sputtering Target high purity GR1 sputtering titanium target ★ Material Titanium Gr. 1 Key words Titanium sputtering target Titanium sputtering more
Brand Name:QUALITY METALS
Model Number:CDX--TB-2021020
Place of Origin:China
Tantalum Sputtering Target Materials Gr1 Titanium Oxide With Pvd Vacuum Coating
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering
...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering more
Brand Name:Sanhui
Model Number:Mo1
Place of Origin:Henan, China
10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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... that the target stays in place during the sputtering process, resulting in a high-quality output. The Metal Sputtering Target is made with 99.99% purity, ensuring that it is free from impurities that may affect the quality of the output. This makes it
... that the target stays in place during the sputtering process, resulting in a high-quality output. The Metal Sputtering Target is made with 99.99% purity, ensuring that it is free from impurities that may affect the quality of the output. This makes it more
Target Configuration:Single Or Multiple
Technique:Forged And CNC Machined
Coating Method:Sputtering
High Purity Sputtering Targets For Thin Film Deposition With Precise Control
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High temperature resistant high quality fused silica sputtering target Silicon dioxide sputtering target contains Si and O. Silicon dioxide (SiO2), also known as Silica, is a natural compound made from two of the most abundant materials on the planet: ...
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...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target...
...Target Pure>3N5 127*458*10 Chromium Sputtering Target Item name Chromium Plate target Size OD127*ID458*10 Pure Pure>3N5 Packaging Vacuum package in wooden case Port of place Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port Related product magnetron sputtering target Rotary Target ito rotary target Titanium Rotary Target Vacuum Package Rotary Target titanium sputtering target Vacuum Coating Target... more
Brand Name:Feiteng
Model Number:Titanium tube target
Place of Origin:Baoji, Shaanxi, China
Feiteng Magnetron Cr Sputtering Target OD127*ID458*10
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... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and
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... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays,
... Sputtering Target Molybdenum Sputtering Target 10.2g/Cm3 Molybdenum Plate 10.2g/Cm3 Send Email Inquiry Now Molybdenum Sputtering Target Description In the electronics industry molybdenum sputtering targets are mainly used for flat panel displays, more
Categories:Molybdenum Products
Country/Region:china
Molybdenum Planar Sputtering Targets
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... from molybdenum powder. In most cases, it is made from the anode itself, which is sintered molybdenum powder, and the target is formed by the anode. Anodes can be stationary or rotating anodes. Other standard methods, chemical vapor deposition, or again,
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Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ...
Torich 133*4*4113mm 304L Planar Sputtering Target Sputtering Target Stainless Steel Tube Torich 133*4*4113mm 304L Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125.2mm ... more
Brand Name:TORICH
Model Number:304L
Place of Origin:China
DIN2462 Stainless Steel Tubing For Planar Sputtering Target
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Molybdenum Copper Alloy Magnetron Sputtering Target 1. Description of Molybdenum Copper Alloy Magnetron Sputtering Target: The preparation of molybdenum-copper alloy magnetron sputtering targets is mainly by infiltration method. First, molybdenum powder...
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...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target...
...sputtering target Plate Planar Billet for Semiconductor Physical Vapor Deposition Tungsten-titanium (WTi) films are known to act as the effective diffusion barrier between Al and Si in semiconductor and photovoltaic cells industry. WTifilms are typically deposited as thin films by physical vapor deposition (PVD) through sputtering of a WTialloy target. It is desirable to produce a target... more
Brand Name:FGD
Model Number:fgd t-002
Place of Origin:China
W-Ti Metal Sputtering Targets Planar Billet For Semiconductor Physical Vapor Depot
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...Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good thermal resistance. - professional after-sales service Commodity Name Pure molybdenum sputtering target...
...Sputtering Target plate sheets Product Description - uniform grain with densified microstructure ensures longer use time. - High special strenghth, high melt point - excellent corrosive resistance, good thermal resistance. - professional after-sales service Commodity Name Pure molybdenum sputtering target... more
Brand Name:HMD
Model Number:NONE
Place of Origin:CHN
TZM Molybdenum Disc SGS Molybdenum Sputtering Target For Medical Chemical Industrial
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NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request Surface ...
NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy Products Description Product Name Nickel 200 Width 1000mm/1219mm/1240mm/1500mm or as customer's requirements Technique Hot rolled cold rolled Length as customer's request Surface ... more
Brand Name:TOBO
Model Number:NI 200
Place of Origin:China
NI 200 nickel alloys sputtering target pure nickel alloy nickel-based alloy
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Pure Titanium 99.99% 4n Disc High Purity Ti Metal Sputtering Target Titanium is metallic and ductile. Sound travels at a rate of 5,090 m/s. The main characteristics of titanium are low density, high mechanical strength and ...
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Aluminum Sheet Customized Aluminum Sheets Metal Aluminum Price Al Sputtering Target Applications of 7075 Aluminum Type 7075 aluminum is one the strongest aluminum alloys. Its high yield strength (>500 MPa) and its low density make the material a fit for ...
Aluminum Sheet Customized Aluminum Sheets Metal Aluminum Price Al Sputtering Target Applications of 7075 Aluminum Type 7075 aluminum is one the strongest aluminum alloys. Its high yield strength (>500 MPa) and its low density make the material a fit for ... more
Brand Name:chengyue
Model Number:7075
Place of Origin:China
Customized Aluminum Sheets Metal Al Sputtering Target 0.2mm 7075
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Hafnium Pellet 99.9% Pure Hf pellet 3N for sale Products attributes of Hf pellets Item Name PVD Coating materials Hf pellet Purity 99.99% Shape Square/Round, According to your request according to your request Available size Normal size:2*5mm,3*3mm,6*6mm ...
Hafnium Pellet 99.9% Pure Hf pellet 3N for sale Products attributes of Hf pellets Item Name PVD Coating materials Hf pellet Purity 99.99% Shape Square/Round, According to your request according to your request Available size Normal size:2*5mm,3*3mm,6*6mm ... more
Brand Name:High Broad
Model Number:Hf sputtering targets
Place of Origin:China
Pure Rare Earth Oxides Hafnium Cylinder Pellet Hf Sputtering Targets Material